The company ASML showed a radiation source power of 250 W for lithography in the hard ultraviolet range
The industry finally came close to implementation in mass production lithography in the hard ultraviolet range (EUV), promising the transition to finer process technology standards. Development in this area being a long time, but one of the stumbling blocks was the radiation source. More precisely, the absence of a source of power which was enough to ensure the performance characteristic of mass production.
It seems that this obstacle is eliminated. This week, the company ASML, which manufactures equipment for the semiconductor industry, demonstrated at the thematic exhibition Semicon West is the source of EUV-radiation with a power of 250 watts.
As stated, such a source will enable to handle 125 wafers per hour.
The idea on the pace of development gives the following fact: in 2012, demonstrated the EUV source power of 25 watts.
Assessment ASML, one unit for EUV-lithography will cost at least $ 100 million. However, its operation is more economically justified in comparison with immersion lithography with three or four templates.
Intel, Samsung, TSMC and Globalfoundries plan to introduce EUV lithography in mass production within the next two years.
Source: CDR info