Samsung unveiled workflows 14LPU and 10LPU; showed 7 nm plate

At the event Samsung Forum Foundry company Samsung Electronics introduced two new process technology: 14-nanometer process technology of the fourth generation 14LPU and 10-nanometer process technology of the third generation 10LPU. According to the manufacturer, these processes are suitable for the production of semiconductor products for a wide range of applications, including mobile devices, hardware, data centers, consumer and automotive electronics.

14LPU process technology delivers higher performance at same power consumption and the design rules that 14-nanometer process technology Samsung third generation 14LPC. It is optimal for products, which require high performance.

The process 10LPU provides a reduction in chip area compared to the 10-nanometer process technology of the previous two generations 10LPE and 10LPP. Because of the limitations of modern lithographic technology, the fabrication process 10LPU may be the most cost-effective advanced process technology in the industry.

Tools for developing projects for release in the process 14LPU and 10LPU will be available in the second quarter of 2017.

In addition, the manufacturer said on develop 7-nanometer process technology with lithography in the hard ultraviolet range (EUV) and demonstrate a silicon wafer.

Source: Samsung Electronics



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